{"id":1853,"date":"2017-09-07T13:55:28","date_gmt":"2017-09-07T20:55:28","guid":{"rendered":"https:\/\/lamrstage.wpengine.com\/product\/striker-product-family\/"},"modified":"2021-08-04T10:20:06","modified_gmt":"2021-08-04T17:20:06","slug":"striker-product-family","status":"publish","type":"product","link":"https:\/\/www.lamresearch.com\/de\/product\/striker-product-family\/","title":{"rendered":"STRIKER Produktfamilie"},"content":{"rendered":"<p>Die j\u00fcngsten Speicher-, Logik- und Bildbearbeitungsger\u00e4te erfordern \u00e4u\u00dferst d\u00fcnne, hoch-konforme dielektrische Schichten f\u00fcr die weitere Verbesserung von Bauteilleistung und -skalierung. Solche Filme sind beispielsweise \u00e4u\u00dferst wichtig f\u00fcr auf Abstandhalter basierende Mehrfachstrukturierungen, wobei die Abstandhalter die kritische Ma\u00dfe (CDs) definieren, ebenso wie die isolierenden Bahnen, die geringe Toleranz selbst f\u00fcr den kleinsten Defekt haben.<\/p>\n<p>Lam&#8217;s Single-Wafer-ALD-Produkte von Striker<sup>\u00ae<\/sup> bieten kritische L\u00f6sungen f\u00fcr diese schwierigen Anforderungen durch anwendungsspezifische Prozesse und Hardwareoptionen \u2013 und liefern erstklassige Filmtechnologie, geringe Defektivit\u00e4t und niedrigste Betriebskosten.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Mit der fortschrittlichen ALD-Technologie liefern diese Produkte dielektrische Filme mit hervorragender Kontrolle f\u00fcr kritische Prozesse in fortschrittlichen Ger\u00e4ten mit Nanoma\u00dfstab.<\/p>\n","protected":false},"author":31,"featured_media":10817,"parent":0,"menu_order":238,"template":"","meta":{"_acf_changed":false,"_relevanssi_hide_post":"","_relevanssi_hide_content":"","_relevanssi_pin_for_all":"","_relevanssi_pin_keywords":"","_relevanssi_unpin_keywords":"","_relevanssi_related_keywords":"","_relevanssi_related_include_ids":"","_relevanssi_related_exclude_ids":"","_relevanssi_related_no_append":"","_relevanssi_related_not_related":"","_relevanssi_related_posts":"","_relevanssi_noindex_reason":"","footnotes":""},"process":[361],"solution":[632,315,345,352],"technology":[309],"class_list":["post-1853","product","type-product","status-publish","has-post-thumbnail","hentry","process-deposition-de","solution-advanced-packaging","solution-advanced-memory-de","solution-patterning-de","solution-transistor-de","technology-atomic-layer-deposition-ald-de"],"acf":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v27.4 - 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Das Auftauchen von 3D-Aufbauten im Zusammenhang mit neuen Methoden des Verkleinerns von Bauteilen treiben wiederum die Notwendigkeit von Innovationen bei der Chipherstellung voran. Um dies zu erm\u00f6glichen, m\u00fcssen Abscheidungsprozesse ultrad\u00fcnne, konforme dielektrische Schichten mit Eigenschaften bieten, die L\u00f6sungen f\u00fcr fortgeschrittene Strukturierung, Kapazit\u00e4tsreduktion, bessere elektrische Isolation und schadensfreie hermetische Einkapselung bieten. Anlagenhersteller wenden sich der ALD-Technologie zu, mit der Filme Schicht f\u00fcr Schicht entstehen und nicht durch die Gr\u00f6\u00dfe und Strukturdichte von Bauteilen beeintr\u00e4chtigt werden, um die ben\u00f6tigen On-Wafer-Ergebnisse zu erzielen. 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