The Galaxy platform combines years of experience in batch wafer processing with advanced process control typically only found on single wafer tools.
The tool design allows single to multiple chamber layout equipped with a semi or full automation system. Additionally, the platform allows multiple substrate sizes to be processed on the same system.
Monitoring and controlling parameters like temperature, pressure, and chemical concentrations can be set and finetuned individually to customers’ requirements.
End point detection system for metal etching processes allows ecological use of chemistry with positive impact on cost of ownership.
Compared to common wet bench systems, the Galaxy platform offers significant water reduction in the smallest footprint.