{"version":"1.0","provider_name":"Lam Research","provider_url":"https:\/\/www.lamresearch.com\/zh-hant\/","author_name":"Sandra Liu","author_url":"https:\/\/www.lamresearch.com\/zh-hant\/author\/sandra-liu\/","title":"Strip & Clean Products | Photoresist Strip. Wet Clean. Plasma Bevel Clean | Lam Research","type":"rich","width":600,"height":338,"html":"<blockquote class=\"wp-embedded-content\" data-secret=\"kJ78tV9V4p\"><a href=\"https:\/\/www.lamresearch.com\/zh-hant\/products\/our-processes\/strip-clean\/\">Strip &#038; Clean<\/a><\/blockquote><iframe sandbox=\"allow-scripts\" security=\"restricted\" src=\"https:\/\/www.lamresearch.com\/zh-hant\/products\/our-processes\/strip-clean\/embed\/#?secret=kJ78tV9V4p\" width=\"600\" height=\"338\" title=\"Strip &#038; Clean &#8212; Lam Research\" data-secret=\"kJ78tV9V4p\" frameborder=\"0\" marginwidth=\"0\" marginheight=\"0\" scrolling=\"no\" class=\"wp-embedded-content\"><\/iframe><script type=\"text\/javascript\">\n\/* <![CDATA[ *\/\n\/*! This file is auto-generated *\/\n!function(d,l){\"use strict\";l.querySelector&&d.addEventListener&&\"undefined\"!=typeof URL&&(d.wp=d.wp||{},d.wp.receiveEmbedMessage||(d.wp.receiveEmbedMessage=function(e){var t=e.data;if((t||t.secret||t.message||t.value)&&!\/[^a-zA-Z0-9]\/.test(t.secret)){for(var s,r,n,a=l.querySelectorAll('iframe[data-secret=\"'+t.secret+'\"]'),o=l.querySelectorAll('blockquote[data-secret=\"'+t.secret+'\"]'),c=new RegExp(\"^https?:$\",\"i\"),i=0;i<o.length;i++)o[i].style.display=\"none\";for(i=0;i<a.length;i++)s=a[i],e.source===s.contentWindow&&(s.removeAttribute(\"style\"),\"height\"===t.message?(1e3<(r=parseInt(t.value,10))?r=1e3:~~r<200&&(r=200),s.height=r):\"link\"===t.message&&(r=new URL(s.getAttribute(\"src\")),n=new URL(t.value),c.test(n.protocol))&&n.host===r.host&&l.activeElement===s&&(d.top.location.href=t.value))}},d.addEventListener(\"message\",d.wp.receiveEmbedMessage,!1),l.addEventListener(\"DOMContentLoaded\",function(){for(var e,t,s=l.querySelectorAll(\"iframe.wp-embedded-content\"),r=0;r<s.length;r++)(t=(e=s[r]).getAttribute(\"data-secret\"))||(t=Math.random().toString(36).substring(2,12),e.src+=\"#?secret=\"+t,e.setAttribute(\"data-secret\",t)),e.contentWindow.postMessage({message:\"ready\",secret:t},\"*\")},!1)))}(window,document);\n\/\/# sourceURL=https:\/\/www.lamresearch.com\/wp-includes\/js\/wp-embed.min.js\n\/* ]]> *\/\n<\/script>\n","description":"Lam\u2019s photoresist strip and wafer cleaning products provide efficient and effective removal of photoresist, residues, and particles without impacting device features. Technologies include dry plasma strip (GxT, G400, G3D), wet clean\/spin clean (DV-Prime, Da Vinci, SP series), and plasma bevel clean (Coronus family).","thumbnail_url":"https:\/\/www.lamresearch.com\/wp-content\/uploads\/2022\/04\/LAM-newmachine-130_fix@2x.png","thumbnail_width":1174,"thumbnail_height":724}