Packaging Solutions | Our Solutions | Lam Research

Powering Faster AI Breakthroughs with Advanced Packaging

Accelerating Beyond the Limits of Scaling

The future of technology is being shaped by the increasing prevalence of electronic devices, from smartphones and tablets to computers and gaming systems. The push for artificial intelligence (AI) is driving the need for more efficient and powerful processing hardware and demanding new semiconductor architectures.

Advanced packaging is a key enabler for overcoming traditional scaling limits and meeting future computing needs. In addition to shrinking transistors, chipmakers are looking beyond the chip into diverse packaging architectures that enhance processing power, memory, speed, and energy efficiency through 3D integration and chiplet technologies.

Blue advanced packaging grid

A pivotal moment for
advanced packaging

Advanced packaging technologies and chiplet designs are essential for meeting the demands of next-generation devices in our technological future. Without solving for today’s advanced packaging challenges, the AI revolution will stall just as it begins to transform the industry.

Without continued advancement in advanced packaging technologies, industries counting on AI-driven transformation—from healthcare to transportation to energy—will see their innovation roadmaps extended by years, not quarters.

This pivotal moment will determine how quickly humanity can solve its most pressing problems through computational advances. The ability to overcome today’s advanced packaging hurdles will directly impact our capacity to develop life-saving medical treatments, create sustainable energy solutions, and build intelligent systems that will define our future prosperity.

How Lam Research is driving innovation with velocity

From plating to etch, advanced packaging requires extreme precision at each step of the chipmaking process. Lam’s approach leverages our decades of leadership in etch and deposition to deliver best-in-class products that allow our customers to build next generation chips with unmatched precision, performance and speed.

Lam’s advanced packaging portfolio centers on three critical innovation areas that address the semiconductor industry’s most pressing challenges:

  1. Large-Format Package Interconnect Leadership: Enabling larger AI packages—scaling from 3.3x to 5.5x to 9x reticle size—across both wafer and panel platforms to meet the growing demands of high-performance computing.
  2. High-Yield Die-to-Wafer (D2W) Assembly: Driving innovations in materials and process solutions for increasingly critical applications in die-to-wafer bonding that enable advanced memory and logic scaling.
  3. Novel Wafer Shape/Stress Management: Pioneering solutions for 3D wafer-on-wafer (3D-WoW) stacking that address critical challenges in wafer bowing, twisting, and bond integrity.
HBM stacks

Our Solutions

Lam’s advanced packaging portfolio enables more powerful AI accelerators to

  • Overcome the memory wall
  • Support increased I/O count
  • Allow for more energy-efficient computing

—all while maintaining reliability and yield essential for commercial success.

Our advanced packaging solutions deliver superior technical performance across all critical parameters: uniformity, yield, process control, and throughput. With industry-leading metrology integration and process capabilities, Lam tools provide the precision and reliability required for today’s most challenging packaging applications.

WETS Product Line

Delivering leading solutions in electroplating and wet processing including photoresist strip, etch and clean

DV-PRIME和DA VINCI产品

湿法清洗

这些产品提供了所需的工艺灵活性和高生产率,以解决整个制造过程中的多个晶片清洗步骤。

SP系列产品

湿法清洗

这些经过验证的产品系列可提供可靠的、成本效益高的湿清洗/湿刻蚀解决方案,可温和地去除晶片上不需要的材料。

SABRE产品系列

电化学沉积 (ECD)

该产品系列广泛应用于大马士革工艺上,提供精密的金属铜电镀。

SABRE 3D产品系列

电化学沉积 (ECD)

利用Lam公司成熟的Electrofill技术,这些高生产率的系统可为先进封装应用提供高质量的金属薄膜。

Dry Etch Solutions

High-productivity solutions to overcome technically challenging requirements in advanced packaging, such as high-aspect -ratio etch (TSV, TDV & TGV) and plasma dicing

FLEX产品系列

Atomic Layer Etch (ALE) 低温刻蚀 反应离子刻蚀(RIE)

Lam的介电刻蚀设备能够刻蚀各种具有挑战性的结构,以应用在先进器件上。

GAMMA Product Family

Dry Strip

这些产品提供了去除各类关键步骤的光刻胶所需的工艺灵活性。

KIYO产品系列

反应离子刻蚀(RIE)

Lam市场领先的导体刻蚀产品能够为关键器件在保障高生产率的前提下提供所需的高精度和控制。

Syndion 产品系列

反应离子刻蚀(RIE) 深反应离子刻蚀(DRIE)

对于深刻蚀应用,此产品系列提供了关键高纵横比特征所需的卓越的跨晶片均匀性控制。

Dielectric and Metal Deposition

Differentiated solutions for PECVD, ALD, and CVD metals. Enabling various film requirements for advanced packaging, including high-bond- strength dielectric, high quality inter-die gapfill film, and film stress tunability for wafer stress and shape management

STRIKER产品系列

原子层沉积(ALD)

使用先进的ALD技术,这些产品提供纳米级尺寸下器件关键工艺所需的介电薄膜。

VECTOR产品系列

等离子体增强化学气相沉积(PECVD)

Lam的PECVD产品系列为广泛的器件应用提供了高生产率的精密介电薄膜沉积。

ALTUS系列产品

化学气相沉积(CVD) 原子层沉积(ALD)

结合化学气相沉积(CVD)和原子层沉积(ALD)技术,这些领先市场的设备可为先进的钨金属化应用沉积出所需之高度均匀一致的(conformal)薄膜。

Yield Improvement and Process Control

Innovative solutions to overcome challenges of emerging advanced packaging applications, such as wafer bevel management for wafer-to-wafer bonding yield improvement and high- throughput process control capability with mass metrology

CORONUS产品系列

Plasma Bevel Etch and Deposition

Coronus 产品专注于晶圆边缘的处理,以提高产品良率。半导体工艺会导致残留物和粗糙度沿着晶圆边缘积聚,并且它们可能会剥落、漂移到其它区域并产生导致器件失效的缺陷。Coronus 刻蚀产品可去除晶圆边缘残留物,Coronus 沉积产品可保护晶圆边缘不受损害。

METRYX产品系列

Mass Metrology

Lam的质量计量系统为先进的工艺监测和三维设备结构控制提供了微克级别的测量能力。

Panel Processing Solutions

Transferring wafer-level processing technology, performance, and production yield, to panel-level processing. Delivering differentiated solutions for wet panel processing, such as Cu RDL, micro-bump, TGV and Cu build-up electroplating, PR/PI strip/develop, etch, roughening, and clean.

Kallisto 产品系列

电化学沉积 (ECD)

先进的立式加工平台,用于对 300×300 毫米 至 5.1 代(1100×1300 毫米)的基板进行湿法化学制备,以满足半工业的需求。

Phoenix 产品系列

光刻胶去除 光刻胶显影 湿法清洗/去胶/刻蚀 电化学沉积 (ECD)

Phoenix 可为 510×515 毫米的基板提供全自动大批量面板加工。

Additional Resources

  • Lam Research Introduces VECTOR TEOS 3D to Address Critical Advanced Packaging Challenges in Chipmaking

    September 9, 2025

  • Everything You Need to Know About VECTOR TEOS 3D

    September 9, 2025

circle-arrow2circle-arrow2facebookgooglehandshake2health2linkedinmenupdfplant2searchtwitteryoutube