Mass Metrology | Products | Lam Research

質量測量產品

提供精密的測量來洞察製程

質量測量技術可測量晶圓在沉積、蝕刻和清洗製程之後的質量變化,以便能夠監測和控制這些經常重複的核心製造步驟。對於薄膜堆疊,高深寬比結構和複雜3D架構等設計,光學技術在精確測量厚、深或視覺上模糊的特徵結構方面的能力有限。測量這些應用的質量變化提供了一種直接的高精度解決方案,可用來監測和控制先進元件結構中的關鍵特徵,而這些特徵通常是不容許有任何變異的。

Lam Research的高精度質量測量系統提供沉積、蝕刻和清洗步驟的即時線上監測和控制 ─ 記錄質量的微小變化,以對潛在的製程偏差實現先進的檢測。


質量測量

產品

METRYX系列產品

Mass Metrology

Lam Research的質量測量系統可為3D 元件結構的先進製程監控提供次毫克級(sub-milligram)的質量測量能力。

Related Blog Posts

  • Mass Metrology Applications Grow With Vertical Scaling

    Jan 18, 2024

    In their ongoing effort to pack more computing power into less space, chip manufacturers are adopting scaling approaches that extend designs and stack components vertically—a major shift from the drive to shrink features horizontally that has dominated the industry for decades. This is especially true for memory devices like 3D NAND. To ensure the performance of these vertical designs, the dimensions of the thick film stacks and the high aspect ratio (tall and narrow) features must be tightly controlled, which requires precise measurement.

  • Metryx Marks 200th Tool Shipment With Classy Donation

    Feb 2, 2023

    What is Metryx? Metryx develops and builds mass metrology tools for semiconductor manufacturers that monitor changes in a wafer’s mass as it goes through the wafer fabrication process. Why it matters: Metryx’s sensitive tools measure the weight of a silicon wafer before and after conducting some processes on the wafer, such as cutting pathways for the integrated circuit. The ability to accurately measure the weight change helps determine whether the operations were correctly completed, so the wafer can move to the next process step.

circle-arrow2circle-arrow2facebookgooglehandshake2health2linkedinmenupdfplant2searchtwitteryoutube