Our Products

Designed for high-volume production with maximum process yield, Akara® increases wafer output and eliminates wasted time, with millisecond response times to any change. The industry’s most advanced etch uniformity controls provide angstrom-level critical dimension uniformity and wafer to wafer repeatability.

Combining CVD and ALD technologies, these market-leading systems deposit highly conformal metal films for advanced tungsten metallization applications.

Coronus systems focus on the bevel edge to enhance overall yield. Semiconductor processing can cause residues and roughness to accumulate along the wafer edge where they may flake off, drift to other areas, and create defects that cause a device to fail. Coronus etch products remove bevel residues and Coronus deposition protect the wafer bevel from damage.

Dextro is a mobile unit with a robotic arm and uses various end-effectors as hands to manage critical equipment maintenance tasks that are time-consuming and prone to errors when done manually. Operated by a fab technician or engineer, Dextro executes complex maintenance tasks with precision and repeatability that are beyond human capability alone, enabling higher tool uptime and manufacturing yield.

These products deliver exceptional process control at high productivity for several critical and non-critical deep silicon etch applications.

These products provide the process flexibility needed with high productivity to address multiple wafer cleaning steps throughout manufacturing.

Our advanced wet clean products deliver exceptionally low on-wafer defectivity at high throughput for progressively demanding applications.

Fabtex™ Yield Optimizer is a cutting-edge software platform designed to help semiconductor foundries accelerate yield ramp and improve high-volume manufacturing performance.

Our dielectric etch systems offer application-focused capabilities for creating a wide range of challenging structures in advanced devices.

These products provide the process flexibility needed to address a wide range of critical photoresist strip applications.

An advanced vertical processing platform for wet chemical treatment of substrates from 300x300mm up to Gen 5.1 (1100 x 1300mm) tailored to the needs of semi industry.

These market-leading conductor etch products deliver the high-performance precision and control at high productivity needed for critical device features.

Our mass metrology systems deliver sub-milligram measurement capability for advanced process monitoring and control of three-dimensional device structures.

OverViz™ is an industrial simulation software platform for high-fidelity modeling of plasma discharges.

Phoenix offers a fully-automated high volume panel processing for 510x515mm substrates.

Our Prestis™ product provides thin film deposition solutions for a wide range of complex multi-element materials for Specialty Technologies applications.

Our Reliant clean products enable roadmaps for Specialty Technologies and extend the productive life of fabs.

Our Reliant deposition products enable roadmaps for Specialty Technologies and extend the productive life of fabs.

Our Reliant etch products enable roadmaps for Specialty Technologies and extend the productive life of fabs.

Using our proven Electrofill technology, these high-productivity systems deliver quality metal films for advanced packaging applications.

This product family offers precision metal plating for copper damascene manufacturing on the industry’s productivity-leading ECD platform.

Breakthrough portfolio delivers isotropic material removal with angstrom-scale precision and ultra-high selectivity capabilities for 3D architectures and advanced logic and foundry applications.

Our semiconductor process modeling software, SEMulator3D®, performs predictive modeling of etch, deposition & other integrated processes, to identify problems prior to fabrication. VizGlow™ is a simulation platform for high-fidelity modeling of non-equilibrium plasma discharges.

SEMulator3D® is a semiconductor process modeling platform that offers wide ranging technology development capabilities.

Our latest etch platform offers unparalleled system intelligence in a compact, high-density architecture to deliver process performance at the highest productivity.

This product family offers specialized post-deposition film treatments to improve physical characteristics for advanced film applications.

This proven product family delivers reliable, cost-efficient wet clean/wet etch solutions that gently remove unwanted materials from the wafer.

These dielectric deposition products provide complete gapfill of high aspect ratio spaces with industry-leading throughput and reliability.

Using advanced ALD technology, these products deliver dielectric films with exceptional control for critical processes in advanced devices with nanoscale features.

For deep etch applications, this product family provides the exceptional across-wafer uniformity control needed for critical high aspect ratio features.

The Triton platform is a versatile and modular solution for single wafer plating and wet processing.

Designed for the Sense.i platform, Vantex redefines high aspect ratio etching with innovations in technology and Equipment Intelligence.

Our PECVD product family provides precise dielectric film deposition at high productivity for a wide range of device applications.

These metal etch products provide excellent process control at high-productivity for electrical connection and metal hardmask applications.