Pulsed laser deposition (PLD) is a very versatile thin film deposition technology that has the ability to deposit a wide range of advanced thin film materials. With today’s market demand for enhanced and new material systems, PLD enables layers that cannot practically be deposited by conventional technologies like PVD reactive sputtering.
This deposition solution enables more advanced device design and is driving the next generation of RF filters for 5G, WiFi 6 and 6E, high-end MEMS microphones and other MEMS applications. PLD technology is in continuous development to meet market demand for new material systems, for applications such as AR/VR and quantum computing. As a leader in the semiconductor industry, we are accelerating the pace of innovation through engineering excellence to help chip-makers create the Specialty Technologies that shape our world today.
The diverse range of applications in Specialty Technologies requires the processing of emerging materials. One such material is aluminum scandium nitride (AlScN) with high scandium content. With the growth of the 5G market, the need for higher frequency band filters is creating challenges for existing high-volume production technologies. To address these challenging requirements, a very versatile thin film deposition technology is required to enable more advanced device design. Lam’s Prestis™ products enable mass production of ≥ 40% AlScN films.