Pulsed laser deposition (PLD) is a very versatile thin film deposition technology that has the ability to deposit a wide range of complex multi-compound materials. With today’s market demand for enhanced and new material systems, PLD enables layers that cannot be deposited by conventional technologies like reactive sputtering or ALD.
Lam’s Pulsus™ PLD products enable mass production of > 30% ScAlN films for Specialty Technologies applications. This deposition solution enables more advanced device design and is driving the next generation of RF filters for 5G and WiFi 6, high-end MEMS microphones and other MEMS applications. New technologies, based on oxide and nitride films, are in continuous development to meet market demand.